聚硅烷在溶液中的降解研究。闪光光解和脉冲辐射解的研究

Carmen Peinado, Thomas Wollny, Wolfram Schnabel
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引用次数: 1

摘要

结构为- sir1r2 - (R1,甲基;R2、苯基、正丙基、正己基、β-苯乙基)和共聚物(重复单元:- sime2和siphe2 -)用347 nm紫外光或15 MeV电子照射。光解和辐射解的主要特征都是主链断裂。光散射(LS)测量确定的典型主链断裂量子产率为:φ(S) = 0.2[聚甲基-正己基硅烷]和φ(S) = 0.5[聚甲基-β-苯乙基硅烷]。旋转半径rG与MW的关系为rG∝MvW;V = 0.5。闪光光解和脉冲辐射解研究结合光学吸收和LS测量表明,主链裂解发生得非常快(τ< 20ns)。所得聚合物碎片表现出可能源于自由基的瞬态光学吸收。脉冲后LS强度下降的速率对应于主链裂解产生的碎片分离速率。对于聚硅烷溶液,在溶剂质量较差的液体中,碎片分离速率由聚合物段之间物理相互作用对应的接触对的寿命决定[在66/34 (v/v)的1,4-二氧六环/1-丙醇混合物中,在23°C下约100 μs]。结果表明,在苯溶液中,溶剂向聚硅烷的能量转移使主链断裂敏化。
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On the degradation of polysilanes in solution. Flash photolysis and pulse radiolysis studies

Polysilanes (catena-polysilicons) of the structure—SiR1R2—(R1, methyl; R2, phenyl, n-propyl, n-hexyl, β-phenethyl) and a copolymer (repeating units:—SiMe2—and—SiPhe2—) were irradiated with UV light (347 nm) or 15 MeV electrons. The dominant feature in both photolysis and radiolysis is main-chain scission. Typical quantum yields of main-chain scission determined by light scattering (LS) measurements are: φ(S) = 0.2 [poly(methyl-n-hexyl silane)] and φ(S) = 0.5 [poly(methyl-β-phenethyl silane)]. The radius of gyration rG depends on MW as rGMvW; v = 0.5. Flash photolysis and pulse radiolysis studies in conjunction with optical absorption and LS measurements revealed that main-chain cleavage occurs very rapidly (τ<20 ns). The resulting polymer fragments exhibit transient optical absorption probably originating from free radicals. The rate of decrease in LS intensity after the pulse corresponds to the rate of separation of fragments generated by main-chain cleavage. Regarding solutions of polysilane in liquids of bad solvent quality the rate of fragment separation is determined by the lifetime of contact pairs corresponding to physical interactions between polymer segments [at 23°C ca 100 μs in a 66/34 (v/v) mixture of 1,4-dioxane/1-propanol]. Moreover, it turned out that in benzene solution main-chain scission is sensitized by energy transfer from solvent to polysilane.

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