化学浴沉积技术在硫化锌薄膜研究中的应用综述

T. S. T. Shobana, Venkatesan Thirumal, D. K. D. Kathirvel
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引用次数: 3

摘要

目前,通过选择合适的化学方法合成金属硫属化合物,由于其适宜性、简单性和成本效益而受到广泛关注。主要的是,薄膜技术导致了大规模沉积技术,使用各种衬底,如绝缘体,半导体和金属。这些方法适用于低温,减少了基材氧化和腐蚀的机会。在各种方法中,化学浴沉积法因其优于传统的薄膜沉积法而备受关注。此外,它不需要高温,也不需要复杂昂贵的设备。大多数研究人员关注的是金属硫化物;它们有广泛的应用,如传感器、调制器、介电滤波器、led、平板显示器中的高效荧光粉和太阳能电池中的缓冲层。本文对薄膜沉积的研究进行了综述,并提供了必要的背景理论。详细介绍了化学浴沉积法制备附着力好、均匀的硫化锌薄膜的方法。强调了浴液参数和结构、形态、光学和电学性质。
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A Comprehensive Review on Zinc Sulphide Thin Film by Chemical Bath Deposition Techniques
Nowadays, the synthesis of metal chalcogenides has received wide attention because of their suitability, simplicity and cost-effectiveness for large scale deposition by the selection of suitable chemical methods. Predominantly, thin-film technology has led to large-scale deposition techniques, using the variety of substrates such as insulators, semiconductors and metals. These methods are applicable at low temperatures, reducing the chances of oxidation and corrosion of the substrate. Among the various methods, Chemical Bath Deposition is highly attractive, owing to its advantages over conventional thin film deposition method. Moreover, it does not require high temperature as well as sophisticated and expensive equipment. Most researchers focused on the metal sulphides; they have a wide range of applications like sensors, modulators, dielectric filters, LEDs, efficient phosphors in flat panel display and buffer layers in the solar cells. A comprehensive review has been attempted in this work with necessary background theory for the thin film depositions. The Chemical Bath Deposition method has been reviewed in detail to obtain well-adherent and uniform zinc sulphide thin films. Bath parameters and structural, morphological, optical, and electrical properties were highlighted.
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来源期刊
Journal of Water and Environmental Nanotechnology
Journal of Water and Environmental Nanotechnology Materials Science-Materials Science (miscellaneous)
CiteScore
2.40
自引率
0.00%
发文量
0
审稿时长
8 weeks
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