胶体溶液中TiO2纳米粒子的电弧等离子沉积

V. Maksimović, M. Stoiljković, V. Pavkov, J. Ciganovic, I. Cvijović-Alagić
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引用次数: 0

摘要

金属生物材料的表面修饰可以极大地改善硬组织植入物的性能,从而有助于手术植入过程的成功。涂层沉积是众多表面修饰技术之一,可用于改善种植体表面特性,进而诱导成功的骨整合。在金属种植体表面沉积TiO2层,不仅可以增强金属种植体的骨整合能力,还可以提高金属种植体的生物相容性和耐腐蚀性。在本研究中,研究了在常压放电等离子体中喷射胶体纳米颗粒水溶液,成功在最常用的金属植入材料——商品纯钛(CP-Ti)表面沉积TiO2层的可能性。为了表征用于涂层沉积过程的胶体TiO2纳米粒子溶液,采用透射电镜(TEM),扫描电镜(SEM)和光学轮廓术(opilometry)对沉积的面层形貌和质量进行了研究。通过对沉积膜质量和质地的评价,证实了电弧等离子体沉积技术可以作为一种先进且易于应用的方法,在金属种植体材料表面涂覆具有生物活性的TiO2层,通过改善种植体表面性能,有利于骨整合过程。利用电弧等离子体沉积技术成功地沉积了TiO2涂层,并覆盖了CP-Ti基板的整个表面,没有任何涂层开裂或脱落的迹象。
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Arc Plasma Deposition of TiO2 Nanoparticles from Colloidal Solution
Surface modifications of metallic biomaterials can in great merit, improve the properties of the hard-tissue implants and in that way contribute to the success of the surgical implantation process. Coating deposition stands out as one of the many surface-modifying techniques that can be used to improve implant surface properties and, in turn, induce successful osseointegration. Deposition of the TiO2 layer on the surface of the metallic implants has a great potential to enhance not only their osseointegration ability but also their biocompatibility and corrosion resistance. In the present study, the possibility of successful deposition of the TiO2 layer on the surface of commercially pure titanium (CP-Ti), as the most commonly used metallic implant material, by spraying the colloidal nanoparticles aqueous solution in the electric discharge plasma at atmospheric pressure was investigated. To characterize the colloidal TiO2 nanoparticle solution, used for the coating deposition process, transmission electron microscopy (TEM) was utilized, while scanning electron microscopy (SEM) and optical profilometry were used to investigate the deposited surface layer morphology and quality. Estimation of the deposited film quality and texture was used to confirm that the arc plasma deposition technique can be successfully used as an advanced and easy-to-apply method for coating the metallic implant material surface with the bioactive TiO2 layer which favors the osseointegration process through the improvement of the implant surface properties. The TiO2 coating was successfully deposited using the arc plasma deposition technique and covered the entire surface of the CP-Ti substrate without any signs of coating cracking or detachment.
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