衬底性质对化学浴法制备硫化锡纳米薄膜性能的影响

Baha'a A. M. Al- Hilli, Zahra'a A. Abood, Muhammed Saleh Mehdi
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引用次数: 0

摘要

由于薄膜与衬底之间的热与晶格不匹配,衬底的性质对半导体薄膜的特性起着重要的作用。在这项研究中,使用简单和低成本的化学浴沉积技术,在不同的衬底(聚酯,玻璃和硅)上生长硫化锡(SnS)纳米结构薄膜。利用x射线衍射仪(XRD)、场发射扫描电镜(FESEM)和紫外-可见-近红外光谱(UV-Vis-NIR)研究了生长薄膜的结构、形态和光学性能。制备的膜的XRD和FESEM结果表明,每层膜都是多晶的,具有正交和立方两种结构类型。此外,沉积在聚酯和玻璃上的薄膜在UV-Vis-NIR范围内具有良好的吸收性能。
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The Effect of substrate Nature on the properties of Tin Sulfide Nanostructured films Prepared by chemical bath deposition
The substrate's nature plays an important role in the characteristics of semiconductor films because of the thermal and lattice mismatching between the film and the substrate. In this study, tin sulfide (SnS) nanostructured thin films were grown on different substrates (polyester, glass, and silicon) using a simple and low-cost chemical bath deposition technique. The structural, morphological, and optical properties of the grown thin films were investigated using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), and ultraviolet-visible-near infrared (UV-Vis-NIR) spectroscopy. The XRD and FESEM results of the prepared films revealed that each film is polycrystalline and exhibits both orthorhombic and cubic structure types. In addition, the deposited films on polyester and glass showed good absorption in the UV-Vis-NIR range.
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审稿时长
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