作为精神分裂症核心阴性症状的妄想:与药物治疗发展的相关性。

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2021-02-26 DOI:10.1038/s41537-021-00145-4
Gregory P Strauss, Lisa A Bartolomeo, Philip D Harvey
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引用次数: 0

摘要

长期以来,阴性症状一直被认为是精神分裂症的核心组成部分。关于阴性症状结构的现代概念认为,阴性症状至少有两个广泛的维度(动机和愉悦感以及表达能力减退),或者可能有五个可分离的领域(逃避、失乐症、非社会性、情感迟钝、焦虑症)。本综述综合了一系列新出现的研究,表明逃避可能在这些维度中占有特殊地位,因为它通常与较差的结果相关,并可能具有独特的神经生物学机制。网络分析的研究结果还表明,逃避是精神分裂症其他阴性症状领域的高度核心和相互联系,成功地补救逃避会导致整个阴性症状群的全面改善。因此,逃避可能反映了阴性症状结构中最关键的治疗目标。本文讨论了靶向治疗开发和临床试验设计的意义。
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Avolition as the core negative symptom in schizophrenia: relevance to pharmacological treatment development.

Negative symptoms have long been considered a core component of schizophrenia. Modern conceptualizations of the structure of negative symptoms posit that there are at least two broad dimensions (motivation and pleasure and diminished expression) or perhaps five separable domains (avolition, anhedonia, asociality, blunted affect, alogia). The current review synthesizes a body of emerging research indicating that avolition may have a special place among these dimensions, as it is generally associated with poorer outcomes and may have distinct neurobiological mechanisms. Network analytic findings also indicate that avolition is highly central and interconnected with the other negative symptom domains in schizophrenia, and successfully remediating avolition results in global improvement in the entire constellation of negative symptoms. Avolition may therefore reflect the most critical treatment target within the negative symptom construct. Implications for targeted treatment development and clinical trial design are discussed.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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