Deep-reactive ion etching of silicon nanowire arrays at cryogenic temperatures
已完结10由 居鸭 发布于 2024/11/22 13:09:27
DOI:10.1063/5.0166284
作者:Jiushuai Xu, Andam Deatama Refino, Alexandra Delvallée, Sebastian Seibert, Christian Schwalb, Poul Erik Hansen, Martin Foldyna, Lauryna Siaudinyte, Gerry Hamdana, Hutomo Suryo Wasisto, Jonathan Kottm
文献类型:期刊论文
补充材料:只需要正文