Effect of the doping compensation on the photoluminescence spectra of ZnO doped by nitrogen

P. B. Parchinskiy, A. Nebesniy, A. Nasirov, A. S. Gazizulina, A. O. Arslanov, R. Nusretov, S. Yuldashev
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Abstract

Photoluminescence measurements have been carried out to investigate the effects of the doping compensation on the near band edge emission lines in the nitrogen doped ZnO thin films grown on silicon substrates by using ultrasonic spray pyrolysis method. The results of the PL spectra for the N-doped layers show that the peak positions of the near band edge emission lines shift to higher energy with increasing temperature within the low-temperature region. The radiative recombinations of the carriers are related to the band-tail states, and the temperature-dependent blueshifts are analyzed by using a Gaussian distribution of the charged impurities.
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掺杂补偿对氮掺杂ZnO光致发光光谱的影响
采用超声喷雾热解法对硅基氮掺杂ZnO薄膜进行了光致发光实验,研究了掺杂补偿对薄膜近带边缘发射谱线的影响。n掺杂层的PL光谱结果表明,在低温区域内,近带边缘发射谱线的峰值位置随着温度的升高而向高能量方向移动。载流子的辐射复合与带尾态有关,并利用带电杂质的高斯分布分析了随温度变化的蓝移。
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