Plasma electronics. Theoretical and experimental investigations of plasma nonlinearity in the traveling-wave tube oscillators

Y. Bliokh
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引用次数: 1

Abstract

Many years of plasma electronics development has led to powerful microwave devices creation. Due to use of plasma-filled electromagnetic structures these devices exhibit significant increase of efficiency, power and radiation bandwidth. Plasma-filled traveling-wave oscillators have been developed and studied. Special investigations of low frequency plasma oscillations, which appear in the powerful plasma-filled microwave devices, have been carried out. Such oscillations are one of the possible reasons for microwave generation pulse shortening. The usual premise of many investigations of beam-plasma instability is the assumption of independence of plasma parameters from microwave power. However various reasons for a dependence exist and the main are high frequency pressure (HFP) and high frequency discharge. Both these reasons lead to the appearance of a plasma longitudinal inhomogeneity. The resonance character of a beam-wave interaction makes it very sensitive to the inhomogeneity of the medium where the wave is propagated. Experiments are described which show that the role of HFP in increasing microwave power growth. It is confirmed by the large difference between plasma densities near the input and output ends of the system.
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等离子体电子产品。行波管振荡器中等离子体非线性的理论与实验研究
多年来等离子电子的发展导致了强大的微波器件的产生。由于使用等离子体填充的电磁结构,这些器件表现出显著的效率、功率和辐射带宽的提高。等离子体填充行波振荡器已被开发和研究。对大功率等离子体填充微波装置中出现的低频等离子体振荡进行了专门的研究。这种振荡是微波产生脉冲缩短的可能原因之一。许多束流等离子体不稳定性研究的通常前提是假设等离子体参数与微波功率无关。然而,产生这种依赖的原因是多方面的,主要是高频压力和高频放电。这两个原因都导致了等离子体纵向不均匀性的出现。波束相互作用的共振特性使其对波传播介质的不均匀性非常敏感。实验结果表明,HFP在提高微波功率增长中的作用。系统输入端和输出端附近等离子体密度的巨大差异证实了这一点。
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