Exploring optimum growth window for high quality InAs/GaInSb superlattice materials

H. Haugan, G. Brown, M. Kim, K. Mahalingam, S. Elhamri, W. Mitchel, L. Grazulis
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引用次数: 5

Abstract

We report ternary growth studies to develop a largely strained InAs/InGaSb superlattice (SL) material for very long wavelength infrared (VLWIR) detection. We select a SL structure of 47.0 Å InAs/21.5 Å In0.25Ga0.75Sb that theoretically designed for the greatest possible detectivity, and tune growth conditions for the best possible material quality. Since material quality of grown SLs is largely influenced by extrinsic defects such as nonradiative recombination centers and residual background dopings in the grown layers, we investigate the effect of growth temperature (Tg) on the spectral responses and charge carrier transports using photoconductivity and temperature-dependent Hall effect measurements. Results indicate that molecular beam epitaxy (MBE) growth process we developed produces a consistent gap near 50 meV within a range of few meV, but SL spectral sensing determined by photoresponse (PR) intensity is very sensitive to the minor changes in Tg. For the SLs grown from 390 to 470 °C, a PR signal gradually increases as Tg increases from 400 to 440 °C by reaching a maximum at 440 °C. Outside this growth window, the SL quality deteriorates very rapidly. All SLs grown for this study were n-type, but the mobility varied in a variety of range between 11,300 and 21 cm2/Vs. The mobility of the SL grown at 440 °C was approximately 10,000 V/cm2 with a sheet carrier concentration of 5 × 1011 cm-2, but the mobility precipitously dropped to 21 cm2/Vs at higher temperatures. Using the knowledge we learned from this growth set, other growth parameters for the MBE ternary SL growth should be further adjusted in order to achieve high performance of InAs/InGaSb materials suitable for VLWIR detection.
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探索高质量InAs/GaInSb超晶格材料的最佳生长窗口
我们报道了一种用于超长波长红外(VLWIR)探测的大应变InAs/InGaSb超晶格(SL)材料的三元生长研究。我们选择了47.0 Å InAs/21.5 Å In0.25Ga0.75Sb的SL结构,理论上设计了最大的探测率,并调整了生长条件以获得最佳的材料质量。由于生长SLs的材料质量在很大程度上受到生长层中非辐射复合中心和残余背景掺杂等外在缺陷的影响,我们利用光电导率和温度相关的霍尔效应测量研究了生长温度(Tg)对光谱响应和载流子输运的影响。结果表明,我们开发的分子束外延(MBE)生长工艺在几个meV的范围内,在50 meV附近产生一致的间隙,但由光响应(PR)强度确定的SL光谱感知对Tg的微小变化非常敏感。从390℃到470℃生长的SLs, PR信号随着Tg从400℃到440℃的增加而逐渐增加,在440℃达到最大值。在这个生长窗口之外,SL质量迅速恶化。本研究中生长的所有SLs均为n型,但迁移率在11,300 - 21 cm2/Vs之间变化。当载流子浓度为5 × 1011 cm-2时,在440℃下生长的SL迁移率约为10,000 V/cm2,但在较高温度下迁移率急剧下降至21 cm2/Vs。利用我们从这个生长集中学到的知识,应该进一步调整MBE三元SL生长的其他生长参数,以实现适合VLWIR检测的InAs/InGaSb材料的高性能。
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