Comprehensive Analysis of DG-TFET with Ferro Electric Material

Yuvraj Kadale, Prabhat Singh, Dharmendra Singh Yadav
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Abstract

The most fundamental component of the electronics industries is a transistor which is a semiconductor device. Due to the limitation of SS at 60mv/decade of the MOSFET they were replaced with TFETs. A comprehensive analysis carried out on Double Gate Tunnel Field Effect Transistor (DGTFET) compared with a proposed device Ferro electric material based Double Gate Tunnel Field Effect Transistor (NC-DGTFET). This paper gives a comparative analysis between DGTFET and NC-DGTFET or Ferro Electric DGTFET. To get the optimum subthreshold swing of FETs, Ferro electric materials can efficiently be employed to boost the “ON current” and “Transconductance” of TFETs in the “overdrive zone”. Ferro electric materials are gaining popularity in the semiconductor industry due to their high permittivity and polarization properties.
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含铁电材料DG-TFET的综合分析
电子工业中最基本的部件是晶体管,它是一种半导体器件。由于MOSFET在60mv/ 10年的SS限制,它们被tfet取代。对双栅隧道场效应晶体管(DGTFET)与提出的基于铁磁材料的双栅隧道场效应晶体管(NC-DGTFET)器件进行了综合分析。本文对DGTFET与NC-DGTFET或铁电DGTFET进行了比较分析。为了获得最佳的场效应管亚阈值摆幅,可以有效地利用铁电材料在“超速区”提高场效应管的“导通电流”和“跨导”。铁电材料由于其高介电常数和极化特性在半导体工业中越来越受欢迎。
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