P. Liu, C. Lee, M. Hsiung, C. Lee, O. Yaroshchuk, R. Kravchuk
{"title":"Plasma beam alignment of liquid crystal with improved alignment stability [LCD manufacture]","authors":"P. Liu, C. Lee, M. Hsiung, C. Lee, O. Yaroshchuk, R. Kravchuk","doi":"10.1109/ICMECH.2005.1529386","DOIUrl":null,"url":null,"abstract":"A method of plasma beam treatment providing liquid crystal (LC) aligning substrates of improved alignment stability is described. In this method the aligning substrates are obliquely treated with a plasma flux containing alignment and passivation agents simultaneously. This method is applicable for the substrates of organic and inorganic origin. During this treating process, good pretilt angle stability and alignment quality are much promised.","PeriodicalId":175701,"journal":{"name":"IEEE International Conference on Mechatronics, 2005. ICM '05.","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Conference on Mechatronics, 2005. ICM '05.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMECH.2005.1529386","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A method of plasma beam treatment providing liquid crystal (LC) aligning substrates of improved alignment stability is described. In this method the aligning substrates are obliquely treated with a plasma flux containing alignment and passivation agents simultaneously. This method is applicable for the substrates of organic and inorganic origin. During this treating process, good pretilt angle stability and alignment quality are much promised.
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