Comparative studies of green molding compounds for the encapsulation of Cu/low-k packages

S. Chungpaiboonpatana, F. Shi, M. Todd, L. Crane
{"title":"Comparative studies of green molding compounds for the encapsulation of Cu/low-k packages","authors":"S. Chungpaiboonpatana, F. Shi, M. Todd, L. Crane","doi":"10.1109/ISAPM.2005.1432091","DOIUrl":null,"url":null,"abstract":"The experimental results are reported on the 80 leads ETQFP module-level understanding of the performance between two green molding compound types in the packaging of 90nm Cu/low-k Si devices using Cu/Ag leadframe. The stress-induced Cu/Ag leadframe-finish migration is observed for a P-contained molding compound, while a new hydrophobic nitrogen-based flame retardant molding compound does not lead to any electromigration failure. Based on the extensive electrochemical and failure analyses, the failure mechanism is elucidated: it is found that Cu/Ag lead-finish migration is induced by the stressed formation of phosphoric acids during extended biased and specific temperature/moisture stressing. Its dendritic extension reflects a non-coplanar pattern and a cathodic-anodic electrochemical cell characteristic through the epoxy matrix. A migration model was proposed to prevent similar failure recurrences in future materials introduced to the industry.","PeriodicalId":181674,"journal":{"name":"Proceedings. International Symposium on Advanced Packaging Materials: Processes, Properties and Interfaces, 2005.","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-03-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings. International Symposium on Advanced Packaging Materials: Processes, Properties and Interfaces, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISAPM.2005.1432091","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

The experimental results are reported on the 80 leads ETQFP module-level understanding of the performance between two green molding compound types in the packaging of 90nm Cu/low-k Si devices using Cu/Ag leadframe. The stress-induced Cu/Ag leadframe-finish migration is observed for a P-contained molding compound, while a new hydrophobic nitrogen-based flame retardant molding compound does not lead to any electromigration failure. Based on the extensive electrochemical and failure analyses, the failure mechanism is elucidated: it is found that Cu/Ag lead-finish migration is induced by the stressed formation of phosphoric acids during extended biased and specific temperature/moisture stressing. Its dendritic extension reflects a non-coplanar pattern and a cathodic-anodic electrochemical cell characteristic through the epoxy matrix. A migration model was proposed to prevent similar failure recurrences in future materials introduced to the industry.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
铜/低钾封装用绿色成型化合物的比较研究
在80引线ETQFP模块级的实验结果中,我们了解了两种绿色成型化合物类型在使用Cu/Ag引线框架封装90nm Cu/低k Si器件中的性能。在含磷成型化合物中观察到应力诱导的Cu/Ag铅框-精加工迁移,而一种新的疏水氮基阻燃成型化合物不会导致任何电迁移失败。在广泛的电化学分析和失效分析的基础上,阐明了Cu/Ag - lead-finish迁移的失效机制:在扩展的偏压应力和特定的温度/湿度应力下,磷酸的应力形成诱导了Cu/Ag - lead-finish迁移。其枝晶延伸通过环氧基体反映了非共面模式和阴极-阳极电化学电池特性。提出了一种迁移模型,以防止在未来引入该行业的材料中再次出现类似的故障。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Improving die attach adhesion on metal leadframes via episulfide chemistry The metallic nickel inserted p/sup -//p/sup +/ Si substrate used for RF crosstalk reduction in mixed signal ICs Effect of laser welding sequence on WIAD in packaging of dual-in-line laser modules Effect of underfill materials on Pb-free flip chip package reliability Microstructure evolution of tin under electromigration studied by synchrotron X-ray micro-diffraction
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1