Multilayer Mirrors and Optics for Low Energy X-Ray and Extreme Ultraviolet Regimes

Abstract

During the past decade techniques for the synthesis of multilayer structures of quality sufficient for application as x-ray and extreme ultraviolet dispersion elements and optic devices have been developed. Physical vapor deposition techniques have been applied to the sequential deposition of layers of two materials having optical constants appropriate for the spectral range of interest. These layers are of extremely high uniformity and vary in thickness from less than 1 nanometer to 100 nanometers. This work follows the early efforts of Dumand and Youtz and the work of Dinkledge and Frericks. More recently Spiller and his coworkers have been working on the development of normal incidence multilayer mirrors specifically for the low energy x-ray domains.