Assessment of the spinning-current efficiency in cancelling the 1/f noise of Vertical Hall Devices through accurate FEM modeling

M. Madec, Laurent Osberger, L. Hébrard
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引用次数: 13

Abstract

The Vertical Hall Device integrable in a shallow N-well, and thus compatible with Low-Voltage CMOS processes, i.e. the LV-VHD, was proposed five years ago. Its layout is similar to the layout of the HV-VHD, i.e. the conventional 5-contact VHD integrated in the deep N-well of High-Voltage processes. However, in the LV-VHD, the Hall voltage is picked-up from the external contacts while it is picked-up from the internal contacts in the HV-VHD. Such sensing schemes make not obvious the application of the well-known Spinning-Current Technique (SCT) used in Horizontal Hall Device (HHD) for offset and 1/f noise attenuation. In this paper, an accurate Finite Element Modeling (FEM) analysis of the SCT for VH-Devices is presented. All the second-order effects which influence the VHD, i.e. the Junction Field Effect (JFE) and the Carrier Velocity Saturation (CVS), are taken into account. Simulation results carried out on a LV-VHD show that SCT remains efficient even under high current biasing, i.e. when CVS takes place.
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通过精确的有限元模拟评估垂直霍尔器件1/f噪声的自旋电流消除效率
垂直霍尔器件可在浅n阱中集成,因此与低压CMOS工艺(即LV-VHD)兼容,这是五年前提出的。其布局类似于高压-VHD的布局,即集成在高压工艺深n井中的常规5触点VHD。然而,在LV-VHD中,霍尔电压从外部触点拾取,而从HV-VHD的内部触点拾取。这种传感方案使得众所周知的旋流技术(SCT)在水平霍尔器件(HHD)中用于偏移和1/f噪声衰减的应用不明显。本文提出了一种精确的vh -器件SCT有限元模型分析方法。所有影响VHD的二阶效应,即结场效应(JFE)和载流子速度饱和(CVS),都被考虑在内。在LV-VHD上进行的仿真结果表明,即使在大电流偏置下,即CVS发生时,SCT仍然有效。
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