InP millimeter wave Schottky barrier mixer diodes for low local oscillator power requirements

A. Christou, W. Anderson, M. L. Bark
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引用次数: 1

Abstract

A number of system applications at millimeter wavelengths have low local oscillator (LO) power requirements in addition to good noise performance. For instance, the replacement of Klystrons by a combination of solid state sources plus frequency multipliers at millimeter wavelengths has a strict LO power requirement. The barrier height φBis the important diode parameter in that it determines the local oscillator power required to bias the Schottky diode into its non-linear region. Schottky barriers to InP exhibit a low barrier due to the fact that the Fermi level is not pinned in the center of the energy gap. However, the development of reliable Schottky barriers to InP has been hampered by the large leakage current Schottky barriers to InP have exhibited. In the present paper, we report on a low barrier height, low leakage current Schottky barrier to InP. The InP Schottky barrier diodes fabricated have exhibited low noise figure at 36 and 94 GHz and require exceptionally low local oscillator power. The metallization scheme consisted of TiW sputtered at 200 W rf power. These diodes were processed with a 5 µm diameter active area on n-n+InP layers. At 36 GHz a noise figure of 6.5-7.0 dB resulted at LO power of .5 mW. At 94 GHz the noise figure of 8.0 dB required a LO power of only 0.75 mW.
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用于低本地振荡器功率要求的毫米波肖特基势垒混频器二极管
许多毫米波系统应用除了具有良好的噪声性能外,还具有低本振(LO)功率要求。例如,用固态源和毫米波倍频器的组合代替速调管有严格的LO功率要求。势垒高度φ是重要的二极管参数,因为它决定了肖特基二极管偏置到非线性区域所需的本振功率。由于费米能级没有被固定在能隙的中心,所以对InP的肖特基势垒表现出一个低势垒。然而,可靠的InP肖特基势垒的发展一直受到InP肖特基势垒所显示的大泄漏电流的阻碍。本文报道了一种低势垒高度、低漏电流的肖特基势垒。所制备的InP肖特基势垒二极管在36 GHz和94 GHz下具有较低的噪声系数,并且需要极低的本振功率。金属化方案包括在200w射频功率下溅射TiW。这些二极管在n-n+InP层上加工了直径为5µm的有源区域。在36 GHz时,噪声系数为6.5-7.0 dB,本振功率为0.5 mW。在94 GHz时,8.0 dB的噪声系数只需要0.75 mW的本端功率。
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