Laser-Induced Damage Thresholds of SiO/sub 2/ Films Grown with Different Assistance Parameters: A Comparative Study Performed by the Photoacoustic Mirage Technique
M. Alvisi, G. De Nunzio, M. Perrone, A. Rizzo, S. Scaglione, L. Vasanelli
{"title":"Laser-Induced Damage Thresholds of SiO/sub 2/ Films Grown with Different Assistance Parameters: A Comparative Study Performed by the Photoacoustic Mirage Technique","authors":"M. Alvisi, G. De Nunzio, M. Perrone, A. Rizzo, S. Scaglione, L. Vasanelli","doi":"10.1109/CLEOE.1998.719466","DOIUrl":null,"url":null,"abstract":"The quality of laser beams strongly depends on the optical characteristics of the cavity mirrors; thus the development of good quality UV/VUV coated optical components is much requested by researchers and industry. The choice of the deposition technique has a considerable influence on the film features: the use of ion assisted techniques is a means of improving the compactness and adhesion of films, while limiting the temperature of the substrate during the deposition.","PeriodicalId":404067,"journal":{"name":"CLEO/Europe Conference on Lasers and Electro-Optics","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-09-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"CLEO/Europe Conference on Lasers and Electro-Optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOE.1998.719466","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The quality of laser beams strongly depends on the optical characteristics of the cavity mirrors; thus the development of good quality UV/VUV coated optical components is much requested by researchers and industry. The choice of the deposition technique has a considerable influence on the film features: the use of ion assisted techniques is a means of improving the compactness and adhesion of films, while limiting the temperature of the substrate during the deposition.