Formation of SiC - like layers on Si surface in contact with C6H5CH3 solution by UV laser irradiation

M. Yusupov, L. Fedorenko, O. Lytvyn, V. Yukhimchuk
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引用次数: 1

Abstract

The review of results of submicron surface layers formation is presented under ultraviolet (UV) N2 - laser (λ = 0.337 μm, tp = 5 ns) ablation of silicon target in liquid environment C6H5CH3. The morphological and deformation state of a near-surface Si layer was investigated by polarization modulation spectroscopy (PMS), atom force microscopy (AFM) and Raman spectra methods before and after irradiation. After irradiation AFM data shows the formation of submicron structures with hexagonal-like type of regularity on Si surface, PMS spectra indicates the increasing of refractive index, Raman spectroscopy reveals the broad band in the range 740-800 cm-1. All that facts allow us to assume the possibility of SiC-like layer formation on silicon monocrystal surface by laser stimulated diffusion of carbon atoms from liquid media. The surface morphology and composition of the irradiated surface varies considerable with the number of laser shots.
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紫外激光辐照与C6H5CH3溶液接触的Si表面形成类SiC层
本文综述了在液体环境C6H5CH3中,紫外(UV) N2 -激光(λ = 0.337 μm, tp = 5 ns)烧蚀硅靶材料形成亚微米表层的结果。采用偏振调制光谱(PMS)、原子力显微镜(AFM)和拉曼光谱等方法研究了辐照前后近表面Si层的形态和变形状态。辐照后的AFM数据显示在Si表面形成了具有六边形规则的亚微米结构,PMS光谱显示折射率增加,拉曼光谱显示740-800 cm-1范围内的宽频带。所有这些事实都允许我们假设,通过激光刺激碳原子从液体介质中扩散,在硅单晶表面形成类sic层的可能性。被照射表面的形貌和组成随激光照射次数的不同而变化很大。
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