A. Smirnov, A. Ivanov, A. Kremleva, S. Sharofidinov, A. Romanov
{"title":"Stress Relaxation Due to Dislocation Formation in Orthorhombic Ga2O3 Films Grown on Al2O3 Substrates","authors":"A. Smirnov, A. Ivanov, A. Kremleva, S. Sharofidinov, A. Romanov","doi":"10.17586/2687-0568-2022-4-3-1-6","DOIUrl":null,"url":null,"abstract":"We analyze the preference of various types of misfit dislocation (MD) formation in film/substrate κ-Ga2O3/α-Al2O3 and κ (AlxGa1–x)2O3/κ-Al2O3 heterostructures. We consider two possibilities for variation in films growth orientation (defined by inclination angle ϑ) for these heterostructures with inclination axes about either [100] or [010] crystallographic directions. We study dependences of the critical film thickness for MD formation on the inclination angle ϑ for heterostructures under consideration. We find the presence of two special orientations (ϑ ~ 26° for [100] heterostructure, ϑ ~ 28° for [010] heterostructure, and ϑ = 90° for both inclination types) of κ-Ga2O3/α-Al2O3 heterostructures, for which the formation of MDs is energetically unfavorable. We show that formation of pure edge MDs is easier for [010] κ-(AlxGa1–x)2O3/κ-Al2O3 heterostructures than for [100] heterostructures, and it is vice versa for mixed MDs in these heterostructures.","PeriodicalId":332408,"journal":{"name":"Reviews on Advanced Materials and Technologies","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Reviews on Advanced Materials and Technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.17586/2687-0568-2022-4-3-1-6","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We analyze the preference of various types of misfit dislocation (MD) formation in film/substrate κ-Ga2O3/α-Al2O3 and κ (AlxGa1–x)2O3/κ-Al2O3 heterostructures. We consider two possibilities for variation in films growth orientation (defined by inclination angle ϑ) for these heterostructures with inclination axes about either [100] or [010] crystallographic directions. We study dependences of the critical film thickness for MD formation on the inclination angle ϑ for heterostructures under consideration. We find the presence of two special orientations (ϑ ~ 26° for [100] heterostructure, ϑ ~ 28° for [010] heterostructure, and ϑ = 90° for both inclination types) of κ-Ga2O3/α-Al2O3 heterostructures, for which the formation of MDs is energetically unfavorable. We show that formation of pure edge MDs is easier for [010] κ-(AlxGa1–x)2O3/κ-Al2O3 heterostructures than for [100] heterostructures, and it is vice versa for mixed MDs in these heterostructures.