PVDF micro machining for the high resolution skin-like tactile sensors

Abstract

This work report PVDF micro machining process by RIE without much loss of its piezoelectric constant. L/S (70/130_μm) of fine structure was realized in this work with high etch rate. O2 mixing feed gases of CF4, CHF3, SF6 and 100 % of O2 were used. At the condition of 100% O2 gas plasma and at a higher of RF power, the better of surface state and higher of aspect ratio structure could be realized.