Gate tunable MoS2-based thermoelectric devices

M. Kayyalha, Yong P. Chen
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Abstract

Two dimensional semiconductors and especially MoS2 have gained a lot of attention due to their unique properties. Finite bandgap, large Ion/Ioff ratio, good mobility, and nearly perfect subthreshold slope are among some of the features that make these materials attractive to researchers. While electrical transport has been studied extensively on single and multilayers of these Transition Metal Dichalcogenides (TMDs) [1, 2], to the best of our knowledge, there has been no experimental study on their thermoelectric properties. Recently, it has been predicted that few layers of TMDs can provide extremely large power factor (S2σ) and thus large ZT making them promising candidates as the future thermoelectric devices [3]. Here, for the first time, we explore gate-dependent thermoelectric properties of multilayer MoS2. As one of the important figures of merit for thermoelectric devices, we also calculate power factor which can then be used to find ZT.
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栅极可调谐mos2基热电器件
二维半导体,特别是二硫化钼,由于其独特的性能而受到了广泛的关注。有限的带隙、大的离子/离合比、良好的迁移率和近乎完美的亚阈值斜率是这些材料吸引研究人员的一些特征。虽然电输运已经在这些过渡金属二硫族化合物(TMDs)的单层和多层上进行了广泛的研究[1,2],但据我们所知,还没有对它们的热电性质进行实验研究。最近,据预测,很少有层的tmd可以提供非常大的功率因数(S2σ),因此大ZT使它们成为未来热电器件的有希望的候选者[3]。在这里,我们首次探索了多层二硫化钼的栅极相关热电特性。作为热电器件的重要性能指标之一,我们还计算了功率因数,并利用功率因数求出ZT。
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