Electron collisions with processing plasma constituents

K. H. Becker
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Abstract

The author is studying the electron-impact dissociation of NF/sub 3/, CF/sub 4/, SF/sub 6/, BCl/sub 3/ and CCl/sub 2/F/sub 2/, which are among the most commonly employed reactive constituents of etchant gas plasmas. The objective is to determine absolute cross sections and appearance potentials for the formation of the various radiating, metastable, and neutral ground-state fragments that are produced by controlled electron-impact dissociation of these molecules. Experimental techniques include electron and optical emission spectroscopy, mass spectroscopy time-of-flight (TOF), and laser-induced fluorescence techniques. Results on molecular emissions in the near ultraviolet region of the optical spectrum are reported. These include the emission of the BCl A to X band system from BCl/sub 3/, the CCl A to X and CCl/sup +/ A to X band systems from CCl/sub 2/F/sub 2/, and continuous UV emissions following dissociative electron impact on SF/sub 6/ and NF/sub 3/.<>
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电子与加工等离子体成分的碰撞
作者研究了蚀刻气体等离子体中最常用的活性组分NF/sub - 3/、CF/sub - 4/、SF/sub - 6/、BCl/sub - 3/和CCl/sub - 2/F/sub - 2/的电子冲击解离。目的是确定各种辐射、亚稳态和中性基态碎片形成的绝对截面和外观电位,这些基态碎片是由这些分子的受控电子冲击解离产生的。实验技术包括电子和光学发射光谱,质谱飞行时间(TOF)和激光诱导荧光技术。报道了光谱近紫外区分子发射的结果。这些包括从BCl/ sub3 /发射的BCl A到X波段系统,从CCl/ sub2 /F/ sub2 /发射的CCl A到X和CCl/sup +/ A到X波段系统,以及解离电子对SF/ sub6 /和NF/ sub3 /的持续紫外辐射。
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