A. Kaziev, D. Kolodko, A. Tumarkin, M. Kharkov, T. V. Stepanova
{"title":"Ion energy distributions at a cathode in a non-sputtering magnetron discharge","authors":"A. Kaziev, D. Kolodko, A. Tumarkin, M. Kharkov, T. V. Stepanova","doi":"10.1109/DEIV.2016.7764021","DOIUrl":null,"url":null,"abstract":"A pulsed non-sputtering magnetron discharge (NSMD) has been studied by Langmuir probe diagnostics and a retarding field energy analyzer (RFA) mounted inside the cathode. Both axial and radial profiles of plasma density and electron temperature are nearly uniform in the magnetic null region. The plasma potential measurements have yielded a positive anode sheath voltage drop Uas ~ 0.4Ud and a corresponding cathode sheath drop Ucs ~ 0.6Ud. RFA results demonstrate that the energy of ions incident at the cathode surface during NSMD does not exceed eUcs. This result is in accordance with the observed inhibition of sputtering process in the NSMD.","PeriodicalId":296641,"journal":{"name":"2016 27th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 27th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DEIV.2016.7764021","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
A pulsed non-sputtering magnetron discharge (NSMD) has been studied by Langmuir probe diagnostics and a retarding field energy analyzer (RFA) mounted inside the cathode. Both axial and radial profiles of plasma density and electron temperature are nearly uniform in the magnetic null region. The plasma potential measurements have yielded a positive anode sheath voltage drop Uas ~ 0.4Ud and a corresponding cathode sheath drop Ucs ~ 0.6Ud. RFA results demonstrate that the energy of ions incident at the cathode surface during NSMD does not exceed eUcs. This result is in accordance with the observed inhibition of sputtering process in the NSMD.