Ion energy distributions at a cathode in a non-sputtering magnetron discharge

A. Kaziev, D. Kolodko, A. Tumarkin, M. Kharkov, T. V. Stepanova
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引用次数: 4

Abstract

A pulsed non-sputtering magnetron discharge (NSMD) has been studied by Langmuir probe diagnostics and a retarding field energy analyzer (RFA) mounted inside the cathode. Both axial and radial profiles of plasma density and electron temperature are nearly uniform in the magnetic null region. The plasma potential measurements have yielded a positive anode sheath voltage drop Uas ~ 0.4Ud and a corresponding cathode sheath drop Ucs ~ 0.6Ud. RFA results demonstrate that the energy of ions incident at the cathode surface during NSMD does not exceed eUcs. This result is in accordance with the observed inhibition of sputtering process in the NSMD.
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非溅射磁控管放电中阴极离子能量分布
利用Langmuir探针诊断和阴极内的延迟场能量分析仪(RFA)研究了脉冲非溅射磁控放电(NSMD)。在磁零区,等离子体密度和电子温度的轴向和径向分布几乎是均匀的。等离子体电位测量结果表明,阳极护套电压降为0.4Ud,阴极护套电压降为0.6Ud。RFA结果表明,NSMD过程中入射到阴极表面的离子能量不超过eus。这一结果与在NSMD中观察到的溅射过程的抑制一致。
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