The efficiency of the pulsed power input in the limited plasma diode

Abstract

The work deals with obtaining a high pulsed power in the high-current plasma diode. It has been shown that under certain conditions in the plasma diode, a space charge double electric layer is formed in the current-carrying plasma. Almost all active discharge voltage focuses on it. In this case the pulse and local energy input into the plasma occurs. The possibility of obtaining the pulsed power inputted into the discharge over 100 MW at relatively small stored energy in capacitor bank (up to 200 J) under conditions of the double layer formation has been shown in this paper. This allows using such plasma diode for generating the powerful directional extreme ultraviolet radiation. The observed radiation power at a wavelength of 13.5 nm reached up to 3 MW. The relation between the radiation directivity and the mechanism of the double layer formation in even and odd half-periods of the discharge current oscillation has been noted in this paper.