Nurmemet Abdukerim, C. Hnatovsky, D. Grobnic, R. Lausten, Stephen Mihailovt
{"title":"Effect of Aberrations in Femtosecond Laser Writing Using the Phase Mask Technique","authors":"Nurmemet Abdukerim, C. Hnatovsky, D. Grobnic, R. Lausten, Stephen Mihailovt","doi":"10.1109/PN.2019.8819556","DOIUrl":null,"url":null,"abstract":"The combined effect of chromatic dispersion and conical diffraction in femtosecond laser writing using the phase mask technique is characterized by measuring the axial intensity distribution. Optimum writing distance from the phase mask is experimentally determined.","PeriodicalId":448071,"journal":{"name":"2019 Photonics North (PN)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 Photonics North (PN)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PN.2019.8819556","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The combined effect of chromatic dispersion and conical diffraction in femtosecond laser writing using the phase mask technique is characterized by measuring the axial intensity distribution. Optimum writing distance from the phase mask is experimentally determined.