The p-n junctions on the basis of CdxHg1-xTe obtained by low-energy treatment with indium and argon ions

N. Ismayilov, E. Huseynov, I. Hasanov, S. Heydarov
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Abstract

The results of experimental research of properties of photodiode structures based on CdxHg1-xTe fabricated by method of treatment of p-type material surface with indium ions with energy 1-5 keV and argon ions with energy 250 eV are introduced. By analysis of electrical and photoelectrical properties obtained structures made conclusion about more quality structure obtained by treatment with indium ions than one with argon ions. Supposed that it is related with more than two order less closes of indium ions than argon ions required to from the conversion layer.
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在CdxHg1-xTe的基础上,用铟和氩离子低能处理得到了p-n结
介绍了用能量为1-5 keV的铟离子和能量为250 eV的氩离子处理p型材料表面制备CdxHg1-xTe光电二极管结构的实验研究结果。通过对所得结构的电学和光电性能分析,得出铟离子处理所得结构质量高于氩离子处理所得结构质量的结论。假设这与铟离子比氩离子要少两个数量级的距离有关。
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