4H-SiC MESFETs behavior after high dose irradiation

C. Brisset, O. Noblanc, C. Picard, F. Joffre, C. Brylinski
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引用次数: 5

Abstract

This study investigates the response of two MESFET 4H-SiC structures to irradiation at very high total dose levels. It demonstrates that electrically active defects created or stimulated by irradiation change the component response. A MESFET with a semi-insulating substrate exhibits better dose response than one with a buffer layer between channel and conductive substrate.
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高剂量辐照后4H-SiC mesfet的行为
本研究考察了两种MESFET 4H-SiC结构对非常高总剂量水平辐照的响应。它表明,由辐照产生或刺激的电活性缺陷改变了元件的响应。具有半绝缘衬底的MESFET比在沟道和导电衬底之间有缓冲层的MESFET具有更好的剂量响应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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