Operating principle verification and scaling benefits of SGLC eNVM

Sung-Kun Park, Nam-Yoon Kim, Eun-Mee Kown, Sangyong Kim, I. Cho, K. Yoo
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引用次数: 6

Abstract

The authors demonstrated and verified the operation of a SGLC eNVM cell using 3D and 2D TCAD simulations. In addition, we have explained the benefits of the SGLC NVM cell as CMOS process design rules shrink. The novel SGLC cell shows a smaller size than 6T SRAM for beyond the 65 nm technology node. The SGLC cell shows ideal characteristics for eNVM, such as a fast program speed, multi-time programmable support, over-erase free features as well as an SRAM comparable cell size without any additional process steps.
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SGLC eNVM的工作原理验证和扩展效益
作者使用3D和2D TCAD模拟演示并验证了SGLC eNVM单元的操作。此外,我们还解释了SGLC NVM单元在CMOS工艺设计规则缩小时的好处。新型SGLC电池在65纳米以上的技术节点上比6T SRAM尺寸更小。SGLC单元显示了eNVM的理想特性,例如快速的程序速度,多时间可编程支持,无擦除功能以及SRAM相当的单元大小,而无需任何额外的处理步骤。
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