Attachment Process of A Downward Negative Flash with Multiple Return Strokes Struck to a 356-m-Tall Tower in Southern China

Yan Gao, Ming-li Chen, Shaoyang Wang, Zilong Qin, Zongxu Qiu, Ge Zhang, Ran Cai, Jun Zhang, Yaping Du
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Abstract

A downward negative flash with nine return strokes struck to the 356-m Shenzhen Tower was analyzed. The high-speed camera captured upward connecting leader (UCL) channels in the first and two subsequent strokes of F1612. The observation results show that none of the downward negative leader channels completely propagated to the tower tip before the occurrence of return stroke (RS), so that the UCL was supposed to be initiated from the tower tip and the attachment process occurred in each RS of this flash. The possible altitude range of the attachment point in each subsequent RS was different. It was found that the larger value of downward dart leader speed might cause the higher altitude of the attachment point. These results could help researchers gain a better understanding of the lightning attachment process, especially occurred in the subsequent return stroke.
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华南地区356米高的高塔上多次回击向下负闪的附着过程
分析了356米深的深圳大厦遭遇的一次向下的负闪九回击。高速摄像机在F1612的第一次冲程和随后的两次冲程中捕获了向上连接的先导(UCL)通道。观察结果表明,在回程冲程发生之前,所有向下负的先导通道都没有完全传播到塔尖,因此,假设UCL是从塔尖开始的,并且附着过程发生在该闪光的每个RS中。随后每次RS中附着点可能的高度范围不同。研究发现,下省先导速度值越大,附着点高度越高。这些结果可以帮助研究人员更好地理解闪电附着过程,特别是在随后的回击中发生的过程。
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