STUDY OF TEMPERATURE EFFECTS IN SILICON STRUCTURES WITH VANADIUM IMPURITIES

Х.С. Далиев, З.М. Хусанов
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Abstract

The current-voltage characteristics of Au-nCdS- nSi-pCdTe-Au at 300 K. It was found that the current-voltage characteristics of such structures has three segments: power-law - I∝V2.44, sublinear V∝exp(Jad), and pre-breakdown dependence - I∝V5.55. The concentrations of deep impurities responsible for the appearance of a sublinear section of the current-voltage characteristic. experimental the results are explained on the basis of theoretical ideas about the complex nature recombination processes in such materials.
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含钒硅结构的温度效应研究
300 K时Au-nCdS- nSi-pCdTe-Au的电流-电压特性。发现该结构的电流-电压特性有三个部分:幂律- I∝V2.44,次线性- V∝exp(Jad),预击穿依赖性- I∝V5.55。引起电流-电压特性亚线性部分出现的深层杂质浓度。实验结果是基于这类材料复杂的自然复合过程的理论解释。
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