Metal contacts to p-type crystalline copper indium diselenide

Sunyoung Park, C. Champness, Z. Mi, I. Shih
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Abstract

To find low resistance metal contacts on p-type crystalline copper indium diselenide (CuInSe2), bilayers of metal contacts were deposited on p-type crystalline CuInSe2. The first metals were Ni, Pt, Se, and Te and the second metals were Au, Ag, Al, and Cu. It was found that the resistance reduced significantly when the surface was etched in a solution containing H2SO4 (1%, w/w) and CrO3 (1%, w/w). It was also confirmed that heat treatment often leads to increase contact resistance. The resistance was measured for over a period of 20 days to estimate the thermal stability of the metal contacts. It was observed that prolonged evacuation time before the metal deposition reduced the resistance.
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金属触点为p型结晶二硒化铜铟
为了寻找p型铜铟二硒化(CuInSe2)晶体上的低电阻金属触点,在p型铜铟二硒化(CuInSe2)晶体上沉积了双层金属触点。第一种金属是Ni、Pt、Se和Te,第二种金属是Au、Ag、Al和Cu。结果表明,在含有H2SO4 (1%, w/w)和CrO3 (1%, w/w)的溶液中刻蚀,表面电阻显著降低。研究还证实,热处理往往会导致接触电阻增加。测量电阻超过20天,以估计金属触点的热稳定性。观察到,在金属沉积前,较长的放电时间降低了电阻。
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