Gold ball-bond mechanical reliability at 40/spl mu/m pitch: squash height and bake temperature effects

J. Beleran, F. Wulff, C. Breach
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引用次数: 6

Abstract

Gold ball-bonding is still used for manufacturing over 90% of the worlds of electronics packages and has moved towards finer pitch in response to increasing demands for more I/O's in smaller spaces. However, as commonly observed when reducing the size of components or features in semiconductor assemblies, reliability decreases. Wirebonding behaves similarly in terms of isothermal bake testing and it is observed that the maximum time ballbonds can be baked without observing high strength ball lifts and low strength ball lifts (HSBL and LSBL respectively) decreases. One of the reasons for this is the need to accommodate smaller bonded balls (by a change of capillary geometry) with diameters not much larger than the wire diameter at pitches of 40 and 35/spl mu/m and even a small loss of bonded ball area by intermetallic degradation can lead to competition between failure at the pad or neck. Previously at pitches >50pm, the larger ball size/wire diameter ratio favoured more robust ballbonding. Understanding the process parameters that affect the occurrence of HSBL and LSBL failures is useful, even if the science behind the root causes of the ball lift phenomenon in ultra-fine pitch applications is currently lacking or at best, developing. An easily controlled and measured parameter is ballbond squash height, which depends on the plastic deformation of the free air ball (FAB) and which might therefore result in ballbond residual mechanical stresses that may couple with geometrical, epitaxial and non-stoichiometry stresses during intermetallic compound growth during ageing. Another factor of interest is the bake temperature, temperatures of interest usually being 150/spl deg/C, 175/spl deg/C and 200/spl deg/C. This paper briefly reports the effects of squash height and bake temperature on the occurrence of ball lifts in a 4N gold wire at 40/spl mu/m bond-pad pitch.
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40/spl亩/米节距下的金球粘接机械可靠性:挤压高度和烘烤温度的影响
世界上90%以上的电子封装仍然使用金球键合技术,并且为了满足在更小的空间内实现更多I/O的需求,金球键合技术已经朝着更细的间距发展。然而,正如通常观察到的那样,当减小半导体组件的尺寸或特性时,可靠性会降低。在等温烘烤测试中,线键的行为与此相似,并且可以观察到,在没有观察到高强度球升和低强度球升(分别为HSBL和LSBL)降低的情况下,球键可以烘烤的最大时间。其中一个原因是需要容纳更小的粘合球(通过改变毛细管几何形状),这些球的直径不会比40和35/spl mu/m的线直径大得多,即使是金属间降解造成的粘合球面积的小损失也会导致衬垫或颈部失效之间的竞争。先前在节距>50pm时,较大的球尺寸/丝径比有利于更牢固的球键合。了解影响HSBL和LSBL故障发生的工艺参数是有用的,即使超细螺距应用中球升现象的根本原因背后的科学目前还缺乏或充其量还在发展中。一个容易控制和测量的参数是球键压扁高度,它取决于自由空气球(FAB)的塑性变形,因此可能导致球键残余机械应力,这些机械应力可能与老化过程中金属间化合物生长过程中的几何、外延和非化学计量应力耦合。另一个感兴趣的因素是烘烤温度,感兴趣的温度通常是150/spl℃,175/spl℃和200/spl℃。本文简要报道了在40/spl mu/m键垫间距下,压扁高度和烘烤温度对4N金丝起球现象的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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