Critical Area Analysis of IC layout for automotive application

J. K. K. Seng, T. Heng, Melzner Hanno
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引用次数: 1

Abstract

Design for Manufacturing (DFM) and Design for Reliability (DFR) are important measure to verify and increase a product's manufacturability and reliability. This assessment can be achieved with Critical Area Analysis (CAA). In this study, the CAA results are correlated to the reliability data in terms of Defect Per Million (DPM) derived from the number of customer's field return units. Our differentiator approach was to analyze the defects and the hot spot location of the failed unit, and map the location to the CAA heat map to investigate if the failure locations fall in the critical area. The analysis was performed on products with high DPM rate. This paper shows some of the mapping examples and the outcome indicated > 50% Back End of Line (BEOL) failure can be potentially avoided upfront in layout design.
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汽车应用集成电路布局的关键区域分析
面向制造设计(DFM)和面向可靠性设计(DFR)是验证和提高产品可制造性和可靠性的重要手段。这种评估可以通过关键区域分析(CAA)来实现。在本研究中,CAA结果与基于客户现场退货数量的每百万次品(DPM)的可靠性数据相关。我们的鉴别方法是分析故障单元的缺陷和热点位置,并将其映射到CAA热图上,以调查故障位置是否落在关键区域。对DPM率高的产品进行分析。本文展示了一些映射示例,结果表明> 50%的后端线(BEOL)故障可以在布局设计中潜在地避免。
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