Generation of quasi-stationary broad pulsed electron beam by the forevacuum plasma source based on the arc discharge

Abstract

The paper describes results of development and investigation processes of pulsed electron beam generation by a plasma electron source in the fore-vacuum pressure range (3-20 Pa). The plasma electron source is based on the cathodic arc discharge. The quasi-stationary pulse length range for electron beam generation is attractive due to possibility of single pulse electron beam technology. One of the main advantages for the fore-vacuum plasma electron sources is its ability for direct treatment dielectric substrates, like ceramics and polymers. Characteristics of the quasi-stationary (1.8 ms) electron beam source based on the arc discharge and research of an electron beam formation in the fore-vacuum pressure range are presented and discussed.