Low-loss reactive sputter deposited titanium oxide waveguides

Abstract

In this work, the fabrication process of optical channel waveguides in titanium dioxide is optimized, including the sputter deposition of titanium dioxide, the reflow of the electron-beam resist and annealing of the etched waveguides. The propagation losses of the films and fully etched strip waveguides had values below 1 dB/cm at wavelengths above 633 nm with propagation losses as low as 0.5 dB/cm at 1550 nm.