Study of bitcell qualification using current and voltage based metric’s in 7nm FinFet Technology

M. Anees, K. Rahul, Santosh Yachareni
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引用次数: 1

Abstract

This paper presents the study of impact from the conventional voltage based metric in designing SRAM in 7nm and advanced FinFet technology. Voltage based metric doesn’t provide the detail of charges that can be injected into the SRAM bitcell node before the bitcell node starts to flip, whereas current based (N-curve) approach gives a better insight which leads to designing of stable and robust SRAM bitcell. The study includes analyzing of bitcell metrics such as read stability and write ability to compare the voltage and current based approach.
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7nm FinFet技术中基于电流和电压度量的位元鉴定研究
本文研究了传统的基于电压的度量对设计7nm SRAM和先进的FinFet技术的影响。基于电压的度量不能提供在bitcell节点开始翻转之前可以注入SRAM bitcell节点的电荷的细节,而基于电流(n曲线)的方法可以更好地了解SRAM bitcell的稳定性和鲁棒性。该研究包括分析bitcell指标,如读取稳定性和写入能力,以比较基于电压和电流的方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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