Formation of TiO 2 Films as a Photocatalytic Material by Ion Beam Assisted Reactive Deposition Method – TDS Study of Ar Atom Incorporation in the TiO 2 Films
M. Sasase, T. Yamaki, K. Miyake, I. Takano, S. Isobe
{"title":"Formation of TiO 2 Films as a Photocatalytic Material by Ion Beam Assisted Reactive Deposition Method – TDS Study of Ar Atom Incorporation in the TiO 2 Films","authors":"M. Sasase, T. Yamaki, K. Miyake, I. Takano, S. Isobe","doi":"10.1016/B978-0-444-82334-2.50137-4","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ion Beam Modification of Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1016/B978-0-444-82334-2.50137-4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
