Design and implementation of 10T-SRAM cell using Carbon Nano Tube Field Effect Transistor

Nagarjuna Reddy Gujjula, Rameshbabu Kellampalli
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Abstract

SRAM is a key component in many VLSI circuits for efficient storage data. Various researches have been performed on implementation of SRAM using Conventional CMOS, FinFET and GNRFET technologies. But, these methodologies generating the more number of faults with high power and delay consumption, tosolve this problem proposed10T SRAM cell is implemented with the CNTFET respectively. Present research involving CNTFET SRAM deals with leakage analysis and dealt with the dual hilarity characteristics. Fault introduction and analysis of faults were limited with CMOS SRAM. The detection algorithms and circuits possess limitations in terms of detecting the current at nanoscales and restricted with CMOS SRAM. These limitations made us to pursue the research in these areas to bring novel ideas. The performance metrics evaluated and experimental analysis is made and it helps us to choose between various SRAMS. The simulation results shows that the proposed 10T SRAM consumes less delay and power compared to the 7T SRAM cell.
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碳纳米管场效应晶体管10T-SRAM电池的设计与实现
SRAM是许多VLSI电路中有效存储数据的关键部件。使用传统CMOS、FinFET和gnfet技术实现SRAM的各种研究已经完成。但是,这些方法产生的故障数量多,功耗高,延迟消耗大,为了解决这一问题,提出了用CNTFET分别实现10t SRAM单元。目前有关CNTFET SRAM的研究主要涉及泄漏分析和对偶性特性。CMOS SRAM的故障引入和故障分析受到限制。检测算法和电路在检测纳米级电流方面存在局限性,并且受到CMOS SRAM的限制。这些限制促使我们在这些领域进行研究,带来新颖的想法。并对性能指标进行了评价和实验分析,帮助我们在各种sram之间进行选择。仿真结果表明,与7T SRAM单元相比,10T SRAM单元消耗的延迟和功耗更低。
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