Ab-initio study of doping versus adsorption in monolayer M0S2

P. Rastogi, Sanjay Kumar, S. Bhowmick, A. Agarwal, Y. Chauhan
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引用次数: 7

Abstract

To modulate the conductivity of channel as well as for controlling threshold voltage of the device doping is required. Sometimes this doping can be unintentional via adsorption of impurities. We have found by ab-initio density functional theory calculations that K and Nb atoms change the system into n-type, and Br changes into p-type if adsorbed on monolayer of MoS2. Similarly Cl, V and P introduce mid-gap states/trap levels in the band gap for adsorption. In case of substitutional doping, it is found that P and Nb make monolayer MoS2 p-type if these elements replace the S atom and the Mo atom, and Cl makes it degenerate n-type if it replaces the S atom in monolayer MoS2.
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单层M0S2掺杂与吸附的ab -从头算研究
为了调制通道的电导率以及控制器件的阈值电压,需要掺杂。有时这种掺杂可能是无意的,通过吸附杂质。我们通过从头算密度泛函理论计算发现,如果K和Nb原子吸附在单层MoS2上,则体系变为n型,Br原子则变为p型。同样地,Cl、V和P在带隙中引入了中隙状态/陷阱能级以进行吸附。在取代掺杂的情况下,发现P和Nb取代S原子和Mo原子使单层MoS2变成P型,Cl取代S原子使单层MoS2变成简并n型。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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