Generation of surface relief hologram and nano structure on azobenzen polymer films and its numerical analysis by moving particle method

Abstract

Surface relief holograms are fabricated by means of irradiation of laser interference patterns. The diffraction efficiency and the surface relief depth depend on the writing energy and the polarization of the writing laser beam. The formation and erasure of photoinduced surface relief gratings (SRGs) on azobenzene-containing polymers are simulated using a numerical model based on the moving-particle semi-implicit (MPS) method. Particle motions in SRG formation and erasure are calculated and the SRG pitch and polarization dependences of the SRG growing and erasing rates are investigated. These theoretical results coincide qualitatively with our experimental results.