{"title":"Effect of parameters on three-beam laser interference","authors":"M. Yu, C. Tan, Zuobin Wang, Le Zhao, Wenjun Li","doi":"10.1109/3M-NANO.2013.6737381","DOIUrl":null,"url":null,"abstract":"Three-beam laser interference is used to create spot or grating patterns by three laser beams. In this paper, effect of parameters on three-beam laser interference is discussed. Computer simulation results have shown that the parameters and their deviations of incident angles, azimuthal angles and polarization states will affect the period, contrast, shape and direction of the spots of three-beam interference patterns. The patterns can be useful for the structuring of different surface patterns in three-beam laser interference lithography.","PeriodicalId":120368,"journal":{"name":"2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale","volume":"44 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/3M-NANO.2013.6737381","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Three-beam laser interference is used to create spot or grating patterns by three laser beams. In this paper, effect of parameters on three-beam laser interference is discussed. Computer simulation results have shown that the parameters and their deviations of incident angles, azimuthal angles and polarization states will affect the period, contrast, shape and direction of the spots of three-beam interference patterns. The patterns can be useful for the structuring of different surface patterns in three-beam laser interference lithography.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
