Influence of device geometry on DC, AC and SOA of high speed ffv bipolar transistors

R. Dutta, T. Krutsick, J. Siket
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Abstract

Detailed characterizations were performed to evaluate the influence of device geometry on the L X , AC and SOA performances of power bipolar transistors. Appropriate performance indices normalized to total device area were defmed, leading to recommendation of a novel baseemitter geometry for optimal performance. Their implementation resulted in significant reduction in silicon area for both NPN and PNP.
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器件几何形状对高速ffv双极晶体管直流、交流和SOA的影响
详细描述了器件几何形状对功率双极晶体管的lx、AC和SOA性能的影响。定义了适当的归一化到总器件面积的性能指标,从而推荐了一种新的基极发射极几何形状以获得最佳性能。它们的实现显著减少了NPN和PNP的硅面积。
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