Admittance spectroscopy and capacitance dispersion of AlGaN/GaN hetero-structures

J. Kaushik, V. R. Balakrishnan, B. Panwar, R. Muralidharan
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Abstract

Admittance spectroscopy of pristine AlGaN/GaN metal-semiconductor interface reveals the distributed trap activation energy in the order of 0.24 eV by mercury probe capacitance-voltage (C-V) measurements. The trap densities of states (Dit) of these traps were extracted in the range of ~1.9×1012 eV-1cm-2 with the reverse bias voltage ranging from -5 Volts to 0 Volt. A very good fitting of admittance spectra (G/ω) was obtained by using the time constants of these traps. The dispersion in the capacitance was corrected to obtain an accurate depth profile of the hetero-structures.
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AlGaN/GaN异质结构的导纳光谱和电容色散
原始AlGaN/GaN金属-半导体界面的导纳光谱通过汞探针电容-电压(C-V)测量揭示了分布在0.24 eV左右的陷阱活化能。在-5 ~ 0伏特的反向偏置电压范围内,提取了~1.9×1012 eV-1cm-2的阱态密度(Dit)。利用这些陷阱的时间常数,得到了很好的导纳谱(G/ω)拟合结果。对电容中的色散进行了校正,得到了异质结构的精确深度分布。
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