CO2 laser doping of Si layers with use of B2O3 as an effective procedure for increasing the sensitivity of detectors in security systems

W. Proszak, O. Bonchyk, S. Kiyak, Zenon Gotral
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引用次数: 1

Abstract

This paper presents results of researches related with solid state doping of Si layers with use CO2 laser irradiation and B203 dopant. Unique properties of laser doping process let us create 10-100 nm doped layers of repeatable parameters.
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用B2O3在CO2激光中掺杂Si层是提高安全系统中探测器灵敏度的有效方法
本文介绍了利用CO2激光辐照和B203掺杂对Si层进行固态掺杂的相关研究结果。激光掺杂工艺的独特特性使我们能够创建10-100 nm的可重复参数的掺杂层。
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