Fabrication and evaluation of GaAs-GaAlAs double-velocity IMPATT diodes

W. Hoke, R. Traczewski
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Abstract

Double-velocity IMPATT diodes have been fabricated and cw tested at X-band. From flat-profile single-drift material, 2.2 watts with II percent efficiency was attained. Somewhat higher efficiency was achieved with a High-Low structure. These results exceed previously reported heterojunction diode measurements. The flat-profile results are comparable to the performance of the corresponding GaAs structure. No significant difference was observed in the thermal resistance of the double-velocity diode and the conventional diode.
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GaAs-GaAlAs双速度IMPATT二极管的制造与评价
制作了双速度IMPATT二极管,并在x波段进行了连续波测试。从平面型单漂移材料,获得2.2瓦和2%的效率。高-低结构实现了更高的效率。这些结果超过了以前报道的异质结二极管测量结果。平面轮廓的结果与相应的GaAs结构的性能相当。双速二极管的热阻与常规二极管的热阻无显著差异。
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