Development of radiation-hard bandgap reference and temperature sensor in CMOS 130 nm technology

M. Kuczynska, Sabina Gozdur, S. Bugiel, M. Firlej, T. Fiutowski, M. Idzik, S. Michelis, J. Moroń, D. Przyborowski, K. Swientek
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引用次数: 2

Abstract

A stable reference voltage (or current) source is a standard component of today's microelectronics systems. In particle physics experiments such reference is needed in spite of harsh ionizing radiation conditions, i.e. doses exceeding 100 Mrads and fluences above 1e15 n/cm2. After such radiation load a bandgap reference using standard p-n junction of bipolar transistor does not work properly. Instead of using standard p-n junctions, two enclosed layout transistor (ELTMOS) structures are used to create radiation-hard diodes: the ELT bulk diode and the diode obtained using the ELTMOS as dynamic threshold transistor (DTMOS). In this paper we have described several sub-1V references based on ELTMOS bulk diode and DTMOS based diode, using CMOS 130 nm process. Voltage references the structures with additional PTAT (Proportional To Absolute Temperature) output for temperature measurements were also designed. We present and compare post-layout simulations of the developed bandgap references and temperature sensors, which show correct operation (<;1mV bandgap stability, linear PTAT) in teperature range -20 to 100 celsius degree.
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基于CMOS 130纳米技术的抗辐射带隙参考和温度传感器的研制
稳定的参考电压(或电流)源是当今微电子系统的标准组件。在粒子物理实验中,尽管电离辐射条件恶劣,即剂量超过100毫微拉德,影响超过15毫微纳/平方厘米,也需要这种参考。在这种辐射负载后,使用双极晶体管标准pn结的带隙基准不能正常工作。采用两个封闭布局晶体管(ELTMOS)结构来代替标准的p-n结来创建抗辐射二极管:ELT体二极管和使用ELTMOS作为动态阈值晶体管(DTMOS)获得的二极管。本文介绍了几种基于ELTMOS体二极管和DTMOS基二极管的亚1v参考器件,采用CMOS 130 nm工艺。电压参考的结构与额外的PTAT(成比例的绝对温度)输出的温度测量也被设计。我们展示并比较了所开发的带隙参考和温度传感器的布局后仿真,结果显示在-20至100摄氏度的温度范围内正确工作(<;1mV带隙稳定性,线性PTAT)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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