C. Liguda, R. Bimm, G. Botiger, A. Kuligh, M. Eich, W. Morgenroth, H. Roth, H. Elsner, H. Meyer
{"title":"Calculation and fabrication of 2D photonic bandgap structures in polymer slab waveguides","authors":"C. Liguda, R. Bimm, G. Botiger, A. Kuligh, M. Eich, W. Morgenroth, H. Roth, H. Elsner, H. Meyer","doi":"10.1109/CLEOE.2000.910019","DOIUrl":null,"url":null,"abstract":"Summary form only. We have simulated 2D lattices in slab and channel waveguide structures by 3D FDTD methods. Low loss dielectric materials (e.g. polymers) were used on low index substrate (fluorinated polymers) layers on silicon wafers. Simulation shows that TE and TM bandgaps are formed for appropriate designs. Wavelengths within the bandgaps are effectively suppressed whereas transmitted waves stay well confined in the waveguide Using novel 3 layer process, high aspect ratio (1:7) sub micron structures were realized by electron beam lithography and reactive ion etching. We will present polarization and wavelength dependent transmission measurements results at NIR telecom wavelengths for various photonic bandgap waveguide designs.","PeriodicalId":250878,"journal":{"name":"Conference Digest. 2000 Conference on Lasers and Electro-Optics Europe (Cat. No.00TH8505)","volume":"7 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Digest. 2000 Conference on Lasers and Electro-Optics Europe (Cat. No.00TH8505)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOE.2000.910019","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Summary form only. We have simulated 2D lattices in slab and channel waveguide structures by 3D FDTD methods. Low loss dielectric materials (e.g. polymers) were used on low index substrate (fluorinated polymers) layers on silicon wafers. Simulation shows that TE and TM bandgaps are formed for appropriate designs. Wavelengths within the bandgaps are effectively suppressed whereas transmitted waves stay well confined in the waveguide Using novel 3 layer process, high aspect ratio (1:7) sub micron structures were realized by electron beam lithography and reactive ion etching. We will present polarization and wavelength dependent transmission measurements results at NIR telecom wavelengths for various photonic bandgap waveguide designs.