T. Kuriyama, T. Aoi, W. Takatsuji, H. Maeda, T. Itoh, Y. Ueno, T. Nakaie, J. Matsui, Y. Miyamoto
{"title":"Electrostatic field distribution measurement using silicon micro-mirror array","authors":"T. Kuriyama, T. Aoi, W. Takatsuji, H. Maeda, T. Itoh, Y. Ueno, T. Nakaie, J. Matsui, Y. Miyamoto","doi":"10.1109/ISEMC.2012.6351823","DOIUrl":null,"url":null,"abstract":"Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-ElectroMechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position sensitive detector (PSD). The obtained electrostatic data showed good agreement with Coulomb's law and the system was applied to a human body model.","PeriodicalId":197346,"journal":{"name":"2012 IEEE International Symposium on Electromagnetic Compatibility","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2012-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE International Symposium on Electromagnetic Compatibility","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISEMC.2012.6351823","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-ElectroMechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position sensitive detector (PSD). The obtained electrostatic data showed good agreement with Coulomb's law and the system was applied to a human body model.