Kinetic roughening and magnetic study of Co electrodeposited thin films

Abstract

In this article, cobalt thin films with 250, 500, and 1000 nm thicknesses were grown on the copper substrate by electrodeposition method. The crystal structure of the cobalt thin film was studied using X-ray diffraction (XRD) and found that the layer and substrate both have orientation (111) and (200). The roughness of the layers was investigated using an atomic force microscope (AFM) and the saturation roughness were measured 5.8, 7.9 and 10.1 nm for 250, 500 and 1000 nm thickness, respectively. Examination of the kinetic roughening of cobalt thin layers showed that they have an anomalous scaling. The magnetic properties of the thin films were checked using a vibrating sample magnetometer (VSM) and their hysteresis loops were drawn and coercivity of samples obtained about 2800 Oe.