S. Ochiai, T. Kato, A. Maeda, M. Ieda, T. Mizutani
{"title":"Morphology and electrical properties of ultra thin PTFE film prepared with RF sputtering","authors":"S. Ochiai, T. Kato, A. Maeda, M. Ieda, T. Mizutani","doi":"10.1109/ICPADM.1994.413977","DOIUrl":null,"url":null,"abstract":"PTFE (polytetrafluoroethylene) film is an excellent insulating material. It also has good hydrophobicity and superior chemical stability. But it is difficult to make good thin films (thickness<10 /spl mu/m). We have obtained ultra thin film (thickness<1 /spl mu/m) with the RF sputtering method. The electric strength of 7.9 nm-thick film is about 7 MV/cm which is much higher than that of a conventional PTFE film. The conduction currents may be Schottky type in a high field region. The contact angle of an thin PTFE film is the almost same as that of a conventional PTFE film and it is 100/spl deg/ at a room temperature. This also means that the morphology of the ultra thin PTFE film (thin PTFE film) is similar to that a conventional PTFE film. The results of the electron spectroscopy for chemical analysis (ESCA) and the X ray diffraction revealed the thin PTFE film is an amorphous rich compound polymer.<<ETX>>","PeriodicalId":331058,"journal":{"name":"Proceedings of 1994 4th International Conference on Properties and Applications of Dielectric Materials (ICPADM)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 1994 4th International Conference on Properties and Applications of Dielectric Materials (ICPADM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICPADM.1994.413977","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
PTFE (polytetrafluoroethylene) film is an excellent insulating material. It also has good hydrophobicity and superior chemical stability. But it is difficult to make good thin films (thickness<10 /spl mu/m). We have obtained ultra thin film (thickness<1 /spl mu/m) with the RF sputtering method. The electric strength of 7.9 nm-thick film is about 7 MV/cm which is much higher than that of a conventional PTFE film. The conduction currents may be Schottky type in a high field region. The contact angle of an thin PTFE film is the almost same as that of a conventional PTFE film and it is 100/spl deg/ at a room temperature. This also means that the morphology of the ultra thin PTFE film (thin PTFE film) is similar to that a conventional PTFE film. The results of the electron spectroscopy for chemical analysis (ESCA) and the X ray diffraction revealed the thin PTFE film is an amorphous rich compound polymer.<>