Jin Zhang, Shilei Jiang, C. Tan, Zuobin Wang, Dayou Li, Y. Yue, Renxi Qiu, Guobin Sun, Lihong Yang, Sanlong Wang
{"title":"Error factors affecting the result of Laser Interference Lithography","authors":"Jin Zhang, Shilei Jiang, C. Tan, Zuobin Wang, Dayou Li, Y. Yue, Renxi Qiu, Guobin Sun, Lihong Yang, Sanlong Wang","doi":"10.1109/3M-NANO.2013.6737387","DOIUrl":null,"url":null,"abstract":"Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.","PeriodicalId":120368,"journal":{"name":"2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale","volume":"57 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/3M-NANO.2013.6737387","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.
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